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Strong Quasiparticle Trapping In A 6x6 Array Of Vanadium-Aluminum Superconducting Tunnel Junctions

机译:在6x6钒铝阵列中捕获的强准粒子   超导隧道结

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摘要

A 6x6 array of symmetrical V/Al/AlOx/Al/V Superconducting Tunnel Junctions(STJs) was fabricated. The base electrode is a high quality epitaxial film witha residual resistance ratio (RRR) of ~30. The top film is polycrystalline withan RRR of ~10. The leakage currents of the 25x25 mm^2 junctions are of theorder of 0.5 pA/mm^2 at a bias voltage of 100 mV, which corresponds to adynamical resistance of ~ 3 10^5 ohms. When the array was illuminated by 6 keVX-ray photons from a 55Fe radioactive source the single photon charge outputwas found to be low and strongly dependent on the temperature of the devices.This temperature dependence at X-ray energies can be explained by the existenceof a very large number of quasiparticle (QP) traps in the Vanadium. QPs areconfined in these traps, having a lower energy gap than the surroundingmaterial, and are therefore not available for tunneling. The number of trapscan be derived from the energy dependence of the responsivity of the devices(charge output per electron volt of photon input energy).
机译:制作了对称的V / Al / AlOx / Al / V超导隧道结(STJs)的6x6阵列。基底电极是高质量的外延膜,其残余电阻比(RRR)为〜30。顶膜是多晶的,RRR为〜10。在100 mV的偏置电压下,25x25 mm ^ 2结的泄漏电流约为0.5 pA / mm ^ 2,相当于〜3 10 ^ 5 ohms的动态电阻。当用来自55Fe放射源的6个keVX射线光子照射阵列时,发现单个光子电荷输出很低,并且强烈依赖于器件的温度.X射线能量的温度依赖性可以通过存在钒中有非常多的准粒子(QP)陷阱。 QP被限制在这些陷阱中,其能隙比周围的材料低,因此无法用于隧穿。陷阱的数目可以从器件的响应度的能量依赖性(光子输入能量的每电子伏特的电荷输出)得出。

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